This book focuses on the design and development of SU-8 polymer and silicon waveguide-based devices using the effective index based matrix method. Various fabrication techniques like laser direct writing (LDW), Focused Ion Beam (FIB) and optical lithography are discussed. FIB lithography has been explored for photonic-crystal structures on the waveguide and for directional coupler in coupled region. This technique is shown to be suitable in fabricating photonic crystal structures as well as for making any precise modifications in micro- and nano-meter photonic waveguide structures. This book can be a useful reference for students, researchers, and fabrication engineers working in the areas of integrated optics, optical communications, laser technology and optical lithography for device manufacturing.