Emphasizing computational algorithms and techniques, this updated edition of a popular monograph provides a complete picture of plasma physics, computational methods, cutting-edge applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. This edition reflects recent progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process.